Carbon Microsystems
Problem
The conventional method for such a transfer is usually implemented by a photo mask made out of glass or crystal Quartz. Although this transfer of micro patterns to resist is rather quick, the design and manufacturing of the photo-mask itself is very time consuming and expensive. This makes the whole MEMS fabrication process expensive and time consuming at the same scale.
Solution
Our solution to this bottleneck is "Getting rid of the photo-mask". By Digital Micro Mirror Devices technology we can write the whole micro pattern to a Digital Micro mirror device pixel by pixel and optically transfer it to the photo-resist. And presuming a good optical design for the transfer, this approach would provide you a good quality of pattern. Our approach makes the whole fabrication process time and cost effective, flexible. We can make more iterations quickly for each design.
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